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MWM100 Black Wax is designed for use as a masking material in jet polishing applications. As it is chemically inert, it is resistant to etching solutions such as hydrofluoric acid, perchloric acid and acetic acid. While it is resistant to many acids, it can be easily removed with hydrocarbon or chlorinated solvents. 100 Gram/Pkg (5 - 20 gram sticks).Moderate Hardness and a Melting Point of 100°C.
Dilutent: Hydrocarbon or Chlorinated solvents.
MWM100 Black Wax is designed for use as a masking material in jet polishing applications. As it is chemically inert, it is resistant to etching solutions such as hydrofluoric acid, perchloric acid and acetic acid. While it is resistant to many acids, it can be easily removed with hydrocarbon or chlorinated solvents. 100 Gram/Pkg (5 - 20 gram sticks).Moderate Hardness and a Melting Point of 100°C.
Dilutent: Hydrocarbon or Chlorinated solvents.
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%100 Memnuniyet
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